20 / 2024-03-27 17:21:35
3D Pic-Mcc simulation of post-arc particles expansion for curved contact under different metal vapour density
vacuum arc,post-arc,pic-mcc
Abstract Accepted
Tong Ziang / University of Science and Technology Beijing
Xiwei Jiang / Inner Mongolia Power (Group) Co., Ltd.
Xiaosong Shen / Shandong Taikai High Voltage Switchgear CO.,LTD.
Zhiliang Guo / Opu Tiancheng (Xiamen) Optoelectronics Co., Ltd.
Yuan Jiang / University of Science and Technology Beijing
Shengxiu Wu / Guizhou Tianyi Electrical Co., Ltd
Jingyi Lin / Beihang University (Beijing University of Aeronautics and Astronautics)
Dejie Wei / Beihang University (Beijing University of Aeronautics and Astronautics)
Shangwen Xia / Beihang University (Beijing University of Aeronautics and Astronautics)
Jianwen Wu / Beihang University
Curved contact is a vacuum interrupter contact structure with excellent interrupting performance. The process of post arc dielectric recovery during the disconnection process is not yet clear. However, one-dimensional and two-dimensional Particle-In-Cell/Monte Carlo (Pic-Mcc) models cannot accurately describe this process. This article establishes a three-dimensional Pic-Mcc model for the dielectric recovery process after vacuum arc of curved contacts. Under different metal vapour density, the particle diffusion process and particle characteristics of curved contact in the post-arc phase were compared and analyzed.

 
Important Date
  • Conference Date

    Nov 10

    2024

    to

    Nov 13

    2024

  • Nov 11 2024

    Draft paper submission deadline

  • Nov 19 2024

    Registration deadline

Sponsored By
Xi’an Jiaotong Universit