Description

The International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA symposium), first held in 1983, gathers experts from all over the world and has always been fruitful and productive. Every year, scientists and engineers discuss and present the state-of-the-art technology R&D and macro development of the industry’s future. It is considered the most important event in Taiwan’s semiconductor industry and highly anticipated by local companies. Taking advantage of the information learned during the conference, the symposium hopes to create new opportunities for Taiwan’s semiconductor industry. The VLSI-TSA symposium is becoming more significant since Taiwan not only occupies a prominent position in the global semiconductor industry, but also is increasingly competitive globally in IC design technology and communications information products.

The VLSI-TSA symposium is proud to create a platform for enriching technical exchange and networking between experts from all over the world. The purpose is to bring together scientists and engineers actively engaged in research, development, and manufacturing on VLSI Technology, Systems and Applications to discuss the latest progress in this field.

 

Retrospect - from 1983 to 2003

• International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA).

• Initiated by Industrial Technology Research Institute in 1983, technical sponsored by IEEE.

• Focus mainly on VLSI Technologies, Circuits and Applications.

• Being held biannually.

• More than 6000 attendees were attracted between 1983-2003.

 

Evolution - starting 2005

• Starting 2005, the conference was divided into two consecutive conferences:
ÜInternational Symposium on VLSI Technology, Systems, and Applications (VLSI-TSA)
    > Focusing on process and advanced technology.
    > With oral presentations and short courses.

ÜInternational Symposium on VLSI Design, Automation, and Testing (VLSI-DAT)
    > Focusing on design, design automation, and testing.
    > With oral presentations, poster presentations, and tutorials.

• The two conferences are held annually in the last week of April with one-day overlap.

• More than 3500 attendees in the past 4 years ( 2006~2009 ) for the 2 conferences.

 

Recent VLSI-TSA & DAT symposia - from 2013 to 2018

• The two conferences are held annually in the last week of April with three-days overlap from 2013 to 2016 and four-days overlap till 2017.

• More than 4,500 attendees attended the VLSI-TSA & DAT symposia.

• In 2018, the number of attendees is around 900. 


 

Schedule

2017-10-21 星期六

全天

2017-10-22 星期日

2017-10-23 星期一

2017-10-24 星期二

2017-10-25 星期三

Call for paper

Description

Student Subsidy:
Financial support for full-time overseas student authors is available.
Up to 85% discount for all students in registration fee.
 
Best Student Paper Award:
The selection will be based on the evaluation by members of technical committees of
students’ papers, as well as their oral presentations during the conference.
The Best Student Paper Award of 2019 VLSI-TSA will be granted to the winning students at the next conference. 

Author guidelines

The paper should be written in English

Submissions of the 2-page camera-ready manuscript in pdf format, including figures and table

In addition to the camera-ready manuscript, the submission should includan 80~100 word abstract

 
 
 
 

Topics of submission

The scope of papers requested in 2019 VLSI-TSA includes the following fields : 

  •  Low power CMOS and embedded memory 
  •  Foundry technology 

  •  RF & THz process, device and integration technology 
  •  Standalone memory: DRAM, FLASH, emerging memory technology 

  •  Advanced process modules: e.g. gate stack, junction, strain/channel engineering, low-R  
     contact, low-C spacer/ILD,         

     interconnect technology, ALE and selective deposition, etc.

  •  Nanopatterning: Multiple patterning, Directed Self-Assembly, EUV, etc. 
  •  Power and analog IC device and technology  
  •  Advanced CMOS process and devices: Ge, SiGe, III-V, FinFET, GAA, 2D materials/1D 
     nanowires  
  •  Material, process and device modeling
  •  TFT and organic electronics 
  •  MEMS, imagers and sensors 
  •  Advanced manufacturing technology, metrology and yield

  •  Reliability physics, characterization and test

  •  Advanced packaging and 2.5D/3D Integration 

  •  Photonics and Beyond CMOS Technology
  •  Energy harvesting technology 

  •  Wearable and loE enabling technologies

  •  Neuromorphic devices and materials for brain-inspired computing 

  •  Quantum phenomena and information technologies

  •  Device technologies for deep learning applications

 

Committee

General Chair and Co-chair
Shinichi Takagi, Chair

The University of Tokyo, Japan

Chih-I Wu, Co-chair

Industrial Technology Research Institute, Taiwan

 

Advisory Committee

(Charles) Kin P. Cheung, NIST, USA 

Yee-Chia Yeo, TSMC, Taiwan 

Raj Jammy, Carl Zeiss, USA 

Carlos Mazure, SOITEC, France

Chorng-Ping Chang, Applied Materials, USA 

Michael Wu, TSMC, Taiwan

 

Steering Committee
Lewis Terman, IBM, USA
Morris Chang,
 TSMC, Taiwan
John Y. Chen, NVIDIA, USA
Tze-Chiang Chen, IBM, USA
Alice M. Chiang, Teratech, USA
Sanford Chu, XMC, China 
Ben M.Y. Hsiao, IBM Emeritus, USA
Genda Hu, FocalTech Systems, Taiwan
Roger De Keersmaecker, RDK Consulting & Coaching, Belgium
G. P. Li, UC Irvine, USA
Rich Liu, Macronix International Co., Ltd., Taiwan
T. P. Ma, Yale Univ., USA
Tak H. Ning, IBM, USA
Jack Sun, TSMC, Taiwan
Paul P. Wang, Duke University, USA
Clement H. Wann, TSMC, Taiwan
H.-S. Philip Wong, Stanford University, USA
Ran H. Yan, Starix Technology, USA
Ping Yang, Intevac, USA
Hwa Nien Yu, IBM Emeritus, USA

 

Technical Program Committee

An Chen, Chair  
IBM, USA

Shih-Chieh Chang, Chair
Industrial Technology Research Institute, Taiwan 


-North America Subcommittee

Wilman Tsai, Chair
TSMC, USA

 

Jason Campbell, NIST, USA

Robert D. Clark, TEL Technology Center, America, LLC, USA

Peide Ye, Purdue University, USA

Angada Sachid, Applied Materials, USA 

Lan Wei, University of Waterloo, Canada

Andrew C. Kummel, University of California, San Diego, USA

Suman Datta, University of Notre Dame, USA

Nicolas L. Breil, Applied Materials, USA

Tim Phung, IBM Almaden Research Center, USA

Sapan Agarwal, Sandia National Laboratories, USA

 

 

-Europe Subcommittee  

Ionut Radu, Chair
SOITEC, France

 

Jean-Pierre Raskin, Université catholique de Louvain, Belgium

Andrea Padovani, MDLab s.r.l., Italy

Carlo Reita, CEA-LETI, France

Robert Strenz, Infineon Technologies Austria AG, Austria

Mostafa Emam, INCIZE, Belgium

François Andrieu, CEA, France


-Asia Pacific Subcommittee

Hiroyuki Ota, Co-chair
National Institute of Advanced Industrial Science and Technology, Japan

Ru Huang, Co-chair

Peking University, China 

Ming-Jinn Tsai, Co-chair
Industrial Technology Research Institute, Taiwan

 

Daniel Chen, UMC, Taiwan

Dai-Ying Lee, Macronix International Co., Ltd., Taiwan

Wen-Kuan Yeh, National Nano Device Laboratories, Taiwan

Chee-Wee Liu, National Taiwan University, Taiwan

Steve Chung, National Chiao Tung University, Taiwan

Bing-Yue Tsui, National Chiao Tung University, Taiwan

Kuan-Neng Chen, National Chiao Tung University, Taiwan

Chrong Jung Lin, National Tsing Hua University, Taiwan

Chenhsin Lien, National Tsing Hua University, Taiwan

Chih-Hao Chang, TSMC, Taiwan 

Seiichiro Kawamura, Japan Science&Technology Agency(JST/CRDS), Japan

Toshifumi Irisawa, National Institute of Advanced Industrial Science and Technology (AIST), Japan

Jiro Ida, Kanazawa Institute of Technology, Japan

Satofumi Souma, Kobe University, Japan

Mansun Chan, Hong Kong University of Science and Technology, China

Zhiping Yu, Tsinghua University, China

Huaqiang Wu, Tsinghua University, China

Jin-Feng Kang, Peking University, China

Dongwon Kim, Samsung, Korea

Kin-Leong Pey, Singapore University of Technology and Design, Singapore

Saurabh Lodha, IITB, India

Hyoungsub Kim, Sungkyunkwan University, Korea 

Jong-Ho Lee, Seoul National University, Korea


Local Organizing Committee (Industrial Technology Research Institute) 
 

Chair: Emily Kuo

Co-chair: Wen-Chi Yang

General Secretariat: Emily Kuo

Secretariat:

Anny Huang

Caroline Huang 

 

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Important dates

  • Conference Dates

    22 Apr.

    2019

    TO

    25 Apr.

    2019

  • 31 Oct.

    2018

    Draft paper submission deadline

  • 28 Dec.

    2018

    Draft paper acceptance notification

  • 15 Jan.

    2019

    Final paper deadline

Contact information

  • Anny Huang
  • vlsitsa@itri.org.tw