Two-photon polymerization of microstructures enables superhydrophobicity on hydrophilic substrates
ID:37 View Protection:ATTENDEE Updated Time:2026-10-10 18:37:54 Hits:28 Invited speech

Start Time:2026-10-17 16:15(Asia/Shanghai)

Duration:20min

Session:S1 Surface Micro/Nano Fabrication, Advanced Manufacturing Equipment and Processes » S1AParallel Session

No files

Abstract
Superhydrophobicity is highly desirable for a wide range of applications. However, achieving it on intrinsically hydrophilic substrates without relying on low-surface-energy coatings presents a significant challenge. This study demonstrates a manufacturing solution to this problem by employing two-photon polymerisation (TPP) to create synergistic re-entrant and hierarchical structures that enforce superhydrophobicity through topography alone. Arrays of mushroom-shaped (MS), inverted-crown mushroom (ICM), and multi-crown mushroom (MCM) microstructures were designed and fabricated. The MCM architecture, which incorporates unique secondary pillars atop micro-caps, achieved a contact angle exceeding 150° and a sliding angle less than 10° on a hydrophilic OrmoComp substrate, as verified by XPS analysis. Numerical simulations elucidate that the re-entrant geometry provides energy barriers that stabilise the Cassie–Baxter state, but these barriers become insufficient at inter-structural gaps over 30 μm for MS and ICM. In contrast, the secondary pillar arrays not only minimise solid-liquid contact to achieve a high contact angle, but also introduce additional dragging forces. As a result, the MCM surface sustains the Cassie–Baxter state even at a spacing of 40 μm. This work demonstrates that TPP is a viable manufacturing route for creating topography-driven superhydrophobicity on intrinsically hydrophilic surfaces without chemical modification.
Keywords
Two-photon polymerization,re-entrant and hierarchical structures,superhydrophobicity
Speaker
Wenhui Yu
Assoc Prof Shandong University of Technology

Submission Author
Wenhui Yu 山东理工大学
Submit Comment
Verify Code Change Another
All Comments
Important Date
  • Conference Date

    Oct 16

    2026

    to

    Oct 18

    2026

  • Oct 14 2026

    Draft paper submission deadline

Sponsored By
中国机械工程学会
Organized By
扬州大学
中国矿业大学
中国机械工程学会表面工程分会
Contact Information
Previous Conferences