Description

The Symposium, hosted by SEMATECH in cooperation with EIDEC and imec, provides a forum to discuss and assess the worldwide status of EUVL technology and infrastructure readiness.

Call for paper

Topics of submission

Presentations for this symposium are being solicited for the following EUVL topics, with a strong preference for contributions discussing HVM introduction and EUVL extendibility. · Exposure tools (ET) · Source-collector module (SO) · Masks (MA) · Resists and materials (RE) · Resist outgassing and contamination (OC) · Metrology and inspection (MI) · Processes enhancing EUV (PE)

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Important dates

  • Conference Dates

    27 Oct.

    2014

    TO

    29 Oct.

    2014

Contact information

  • Marcy DeBiccari
  • euvlsymposium@sematech.org
  • -

Sponsored By

  • The Optical Society