Introduction
This conference will address the broad issues in the growing and very demanding field of surface metrology and characterization of optics for EUV/X-Ray synchrotron and FEL radiation and for other EUV/X-Ray applications such as astronomical imaging, solar physics, and lithography.
Improving the performance of existing instrumentation and techniques, as well as developing new and novel ones, is critical for the fabrication of high-quality optics to meet current and future requirements for these applications.
Call for paper
Submission Topics
Papers are solicited on the following and related topics:
- surface figure and finish measurement
- slope profilometry and interferometry
- sub-aperture stitching
- wavefront sensing and characterization
- at-wavelength metrology of x-ray and EUV optics
- metrology of x-ray astronomy optics
- metrology of coherence-preserving mirrors
- metrology data analysis software and error reduction
- metrology of adaptive optics
- mirror characterization using scattering techniques
- mirror specification and tolerancing
- novel instrumentation and techniques
- mirror performance simulation using metrology data calibration tools and methods.
All Comments
Important Date
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Conference Date
Aug 28
2016
toSep 01
2016
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Sep 01 2016
Registration deadline
Contact Information
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