Introduction
AboutComponents, Circuits, Devices and Systems; Computing and Processing; Engineered Materials, Dielectrics and Plasmas; Engineering Profession; Photonics and Electrooptics
Keywords:Lithography,EUV,Metrology,Inspection,Testing,Design for Manufacturability,Design and Technology Co-optimization,Materials,Device,Process Technologies,
Scope:IWAPS is devoted to publishing research on the cutting-edge microelectronic manufacturing technology. The scope of the conference covers studies of advanced semiconductor manufacturing sciences and technologies from early stage theories and experiments to industrial high volume manufacturing applications. The perspective scope includes, but is not limited to the following areas: i. Optical Lithography ii. Extreme Ultraviolet (EUV) Lithography iii. Advanced Patterning Technologies iv. Metrology, Inspection and Testing v. Design and Technology Co-optimization and Design for Manufacturabilityvi. Materials vii. Device viii. Process
Sponsor Type:3; 3; 9; 9; 9; 9; 9
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Important Date
  • Conference Date

    Dec 12

    2021

    to

    Dec 13

    2021

  • Dec 13 2021

    Registration deadline

Sponsored By
Chengdu Section China Integrated Circuit Innovation Alliance Chinese Optical Society - COL Guangzhou Section Inst. of Microelectronics of the Chinese Academy of Sciences - IMECAS Institute of Optics and Electronics, Chinese Academy of Sciences Nanjing Chengxin Institute of IC Technology
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