International and domestic semiconductor companies have been making major investments in China. This is the motivation behind to organize this Workshop as a first of its kind in China. IWAPS provides a forum for the experts from industry and research institutions worldwide to present and discuss advanced pattering solutions and related challenges such as material, equipment, process, metrology, computational lithography and design optimization. 

The speakers at the workshop are selected by invitation only and represent a broad range of disciplines and covering a wide array of different lithography approaches and requirements. Presentations are arranged to be comprehensive, covering the current practice, the future trends and the challenges ahead. The workshop is intended to provide a platform for attendees from international and domestic institutions to interact and discuss some common challenges faced by the industry. It will also be an opportunity for people to learn more about the semiconductor R&D and business landscape in China.

Call for paper

Important date

Abstract submission deadline

Abstract Instructions

The abstract must clearly describe the nature, scope, content, organization, key points and significance of the proposed paper.

The ABSTRACT must include paper title, key words, author name, affiliation and full contact information (email and address). The Word of Abstract limit is up to 500 words. Introductory paragraph describing the intended content of your conference is a huge plus to your papers. Graphs are highly encouraged in the submitted abstract.

Full Text

After the abstract is accepted, the author needs to submit the final paper in accordance with the requirements of the full-text template. The full text of the paper must be limited to 4 pages. Please send your final paper in Word and PDF version to before the deadline.

Papers of this conference will be submitted to IEEE Xplore and EI for examination. Please be sure to submit the full text before the deadline. Otherwise, it will not be submitted for examination. Please refer to the template format. The full text is limited to 4 pages.
If the full text is longer than four pages, we suggest submitting the full text version that meets the requirements of the conference and the long text version at the same time. We will recommend the long text version to the Journal of Microelectronic Manufacturing when the full text version is submitted to IEEE Xplore and EI. We also welcome authors to contribute to JOMM after expanding the theoretical or experimental content of the full text of the conference.

Presentation Instructions

For oral presenters:

Authors of papers selected for oral presentation shall attend IWAPS 2022 and give a 15 minutes technical overview presentation about your paper. Speakers are responsible for providing a PPT in advance to be uploaded for presentation at the conference. The PPT Due is September 30th 2022. Please send PPT to before the due date.

For poster presenters:

(to be updated).

Submission Topics

Scope of IWAPS Paper

IWAPS is devoted to publishing research on the cutting-edge microelectronic manufacturing technology. The scope of the conference covers studies of advanced semiconductor manufacturing sciences and technologies from early stage theories and experiments to industrial high volume manufacturing applications. The perspective scope includes, but is not limited to the following areas:

i. Optical Lithography

ii. Extreme Ultraviolet (EUV) Lithography

iii. Advanced Patterning Technologies

iv. Metrology, Inspection and Testing

v. Design and Technology Co-optimization and Design for Manufacturability

vi. Materials

vii. Process


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Important Date
  • Conference Date

    Oct 21



    Oct 22


  • Jul 15 2022

    Abstract Submission Deadline

  • Oct 22 2022

    Registration deadline

Sponsored By
The Chinese Optical Society
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